Maskless/E-Beam Discussions
- E-beam direct write is free, Lance A. Glasser, Ph.D.
- Projection Maskless Lithography
- Hans C. Pfeiffer, "The history and potential of maskless e-beam lithography", Microlithography World February, 2005
- Electron beam direct write technology combined with silicon shuttle service, H. Tsuchikawa, M. Takakuwa, S. Sugatani, 4th ISMI Symposium on Manufacturing Effectiveness, October 2007 (Download here link from D2S site)
- B.J. Lin, "The ending of optical lithography and the prospects of its successors," Microelectronic Engineering, 83, 604-613 2006.
- P. Buck, C. Biechler, and F. Kalk, "A Mask Manufacturer's Perspective on Maskless Lithography," Bacus Symposium 25; October 2005.
- Y. Nagahiro, "Application scope of EB exposure writing expands from R&D of advanced devices to prototyping and small production," Nikkei Microdevices, p. 31, June 2003.
- Electron Beam Lithography in Semiconductor Fabrication, Thomas Breser, Leica Microsystems Semiconductor GmbH , February 2005