Historic Maskless Lithography References
- R.F.M. Thornley, M. Hatzakis, "Electron Optical Fabrication of Solid State Devices," Record of 9th Symp. on Electron, Ion and Laser Beam Tech., L. Martin, ed., San Francisco Press, p. 94, 1967.
- H.C. Pfeiffer "Recent Advances in Electron Beam Lithography for High-volume Production of VLSI Devices," IEEE Trans. on Electron Devices, ED-26, No. 4, p. 663, 1979.
- E.V. Weber, H.S. Yourke, "Scanning Electron Beam System Turns out Wafers Fast," Electronics 50, p. 96, 1977.
- R. Moore, G. Caccoma, H. Pfeiffer, E. Weber, O. Woodard, "Electron Beam Writes Next-generation IC Pattern," Electronics 54(22), p. 138, 1981.
- H.C. Pfeiffer, "Direct Write Electron Beam Lithography - A Production Line Reality," Solid State Technology, p. 223, Sept. 1984.
- R.D. Moore, G.A. Caccoma, H.C. Pfeiffer, E.V. Weber, O.C. Woodard, "EL-3: A High Throughput, High Resolution E-beam Lithography Tool," J. Vac. Sci. Technol. 19(4), p. 950, 1981.
- K.H. Brown, D.A. Grose, R.C. Lange, T.H. Ning, P.A. Totta, "Advancing the State of the Art in High-performance Logic and Array Technology," IBM J. Res. Develop. 36, No. 5, p. 821, 1992.
- L. Pain, M. Jurdit, Y. Laplanche, J. Todeschini, H. Leininger, et al., "65 nm Device Manufacture Using Shaped E-beam Lithography," Intl. Conf. on Micro- and Nano-Engineering 2004, to be published in Microelectronic Engineering.
- L. Pain, M. Charpin, Y. Laplanche, D. Henry, "Shaped E-beam Lithography Integration Work for Advanced ASIC Manufacturing," Proc. SPIE, Vol. 4688, p. 607, 2002.
- T. Fujiwara, N. Hirayanagi, J. Udagawa, J. Ikeda, S. Shimizu, et al., "Total Performance of Nikon EB Stepper R&D Tool," Proc. SPIE, Vol. 5374, p. 468, 2004.
- K. Okamoto, K. Suzuki, H.C. Pfeiffer, M. Sogard, "High-throughput Electron Beam Stepper Lithography," Microlithography World, Vol. 10, Winter 2000.
- C. Brandstaetter, H. Loeschner, G. Stengl, G. Lammer, H. Buschbeck, et al., "Projection Maskless Lithography," Proc. SPIE, Vol. 5374, p. 601, 2004.
- H.C. Pfeiffer, "Basic Limitations of Probe Forming Systems Due to Electron-electron Interaction," Proc. 5th Ann. SEM Symp. (IITRI), p. 113, 1972.
- G.I. Winograd, W.D. Meisburger, R.F.W. Pease, "Space-charge-induced Aberrations," J. Vac. Sci. Technol. B 17 (6), p. 2803, 1999.