D2S | Direct2Silicon is a newly-formed, venture-backed company providing software and IP that enables direct write e-beam lithography for production of System-on-Chip integrated circuits (SoCs). Reductions both in design time and manufacturing turnaround time are achieved when neither optical lithography nor masks are needed to make integrated circuits. For modest production runs of 100,000 chips or less, direct write techniques are more cost effective by eliminating mask costs. This puts SoCs at advanced technology nodes back into the reach of many new business opportunities. We call this "D2S VirtualMask™".

History | The D2S technology has been in development since 2002 by an experienced and successful EDA team. The company is in its development stage. It is backed by Benchmark Capital and strategic corporate partners.

Talent | We are looking for great software engineering talent in Japan and SoC physical design, standard cell architecture and implementation talent in US.

Designs | SOC customer/partners who are seeking to develop prototypes, engineering samples and small production runs of 65/45nm SoCs using our technology should contact us for full discussion on your needs.

© 2008 D2S, Inc.